Metal gas deposition is used on the one hand for sample preparation (e.g. for the scanning electron microscope) and on the other hand for surface modification and electrodation. It is possible to create very thin metallic layers on a substrate in a controlled manner by thermal evaporation or sputtering and thus modify its properties.
- Thermal evaporation: gold, calcium, aluminium, silver, copper
- Sputtering: gold, palladium, platinum, nickel, silver, carbon
- PVD in glove box under argon atmosphere possible
